Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity
- DOI
- 10.3390/molecules28176244
- Published
- 2023-08-25
- Container
- Molecules
- Publisher
- MDPI AG
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.3390/molecules28176244,
title = {Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity},
author = {Ji Young Park and Hyun-Ji Song and Thanh Cuong Nguyen and Won-Joon Son and Daekeon Kim and Giyoung Song and Suk-Koo Hong and Heeyoung Go and Changmin Park and Inkook Jang and Dae Sin Kim},
year = {2023},
journal = {Molecules},
doi = {10.3390/molecules28176244},
url = {https://doi.org/10.3390/molecules28176244}
}RIS
TY - JOUR TI - Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity AU - Ji Young Park AU - Hyun-Ji Song AU - Thanh Cuong Nguyen AU - Won-Joon Son AU - Daekeon Kim AU - Giyoung Song AU - Suk-Koo Hong AU - Heeyoung Go AU - Changmin Park AU - Inkook Jang AU - Dae Sin Kim PY - 2023 JO - Molecules DO - 10.3390/molecules28176244 UR - https://doi.org/10.3390/molecules28176244 ER -
APA
Park, J. Y., Song, H., Nguyen, T. C., Son, W., Kim, D., Song, G., Hong, S., Go, H., Park, C., Jang, I., & Kim, D. S. (2023). Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity. Molecules. https://doi.org/10.3390/molecules28176244
Source records
- crossref · retrieved 2026-11-08T16:55:40.239Z