Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning.

Giammaria TJ, Gharbi A, Paquet A, Nealey P, Tiron R

DOI: 10.3390/nano10122443
Published: 2020 Dec 7
Container: Nanomaterials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/nano10122443,
  title = {Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning.},
  author = {Giammaria TJ and Gharbi A and Paquet A and Nealey P and Tiron R},
  year = {2020},
  journal = {Nanomaterials (Basel, Switzerland)},
  doi = {10.3390/nano10122443},
  url = {https://doi.org/10.3390/nano10122443}
}

RIS

TY  - JOUR
TI  - Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning.
AU  - Giammaria TJ
AU  - Gharbi A
AU  - Paquet A
AU  - Nealey P
AU  - Tiron R
PY  - 2020
JO  - Nanomaterials (Basel, Switzerland)
DO  - 10.3390/nano10122443
UR  - https://doi.org/10.3390/nano10122443
ER  -

APA

TJ, G., A, G., A, P., P, N., & R, T. (2020). Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano10122443

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pubmed · retrieved 2026-09-25T12:18:32.906Z