Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching.

Chiappim W, Neto BB, Shiotani M, Karnopp J, Gonçalves L, Chaves JP, Sobrinho ADS, Leitão JP, Fraga M, Pessoa R

DOI: 10.3390/nano12193497
Published: 2022 Oct 6
Container: Nanomaterials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/nano12193497,
  title = {Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching.},
  author = {Chiappim W and Neto BB and Shiotani M and Karnopp J and Gonçalves L and Chaves JP and Sobrinho ADS and Leitão JP and Fraga M and Pessoa R},
  year = {2022},
  journal = {Nanomaterials (Basel, Switzerland)},
  doi = {10.3390/nano12193497},
  url = {https://doi.org/10.3390/nano12193497}
}

RIS

TY  - JOUR
TI  - Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching.
AU  - Chiappim W
AU  - Neto BB
AU  - Shiotani M
AU  - Karnopp J
AU  - Gonçalves L
AU  - Chaves JP
AU  - Sobrinho ADS
AU  - Leitão JP
AU  - Fraga M
AU  - Pessoa R
PY  - 2022
JO  - Nanomaterials (Basel, Switzerland)
DO  - 10.3390/nano12193497
UR  - https://doi.org/10.3390/nano12193497
ER  -

APA

W, C., BB, N., M, S., J, K., L, G., JP, C., ADS, S., JP, L., M, F., & R, P. (2022). Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano12193497

Source records

pubmed · retrieved 2026-09-26T13:27:10.705Z
europe-pmc · retrieved 2026-09-26T13:27:10.699Z