Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen.
- DOI
- 10.3390/nano12213876
- Published
- 2022 Nov 2
- Container
- Nanomaterials (Basel, Switzerland)
- Publisher
- Not recorded
- Open access
- yes
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BibTeX
@article{allodium:10.3390/nano12213876,
title = {Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen.},
author = {Huang S and Ng ZK and Li H and Chaturvedi A and Lim JWM and Tay RY and Teo EHT and Xu S and Ostrikov KK and Tsang SH},
year = {2022},
journal = {Nanomaterials (Basel, Switzerland)},
doi = {10.3390/nano12213876},
url = {https://doi.org/10.3390/nano12213876}
}RIS
TY - JOUR TI - Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen. AU - Huang S AU - Ng ZK AU - Li H AU - Chaturvedi A AU - Lim JWM AU - Tay RY AU - Teo EHT AU - Xu S AU - Ostrikov KK AU - Tsang SH PY - 2022 JO - Nanomaterials (Basel, Switzerland) DO - 10.3390/nano12213876 UR - https://doi.org/10.3390/nano12213876 ER -
APA
S, H., ZK, N., H, L., A, C., JWM, L., RY, T., EHT, T., S, X., KK, O., & SH, T. (2022). Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano12213876
Source records
- pubmed · retrieved 2026-09-25T04:55:22.066Z