Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.

Kull M, Piirsoo HM, Tarre A, Mändar H, Tamm A, Jõgiaas T

DOI: 10.3390/nano13101607
Published: 2023 May 10
Container: Nanomaterials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/nano13101607,
  title = {Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.},
  author = {Kull M and Piirsoo HM and Tarre A and Mändar H and Tamm A and Jõgiaas T},
  year = {2023},
  journal = {Nanomaterials (Basel, Switzerland)},
  doi = {10.3390/nano13101607},
  url = {https://doi.org/10.3390/nano13101607}
}

RIS

TY  - JOUR
TI  - Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.
AU  - Kull M
AU  - Piirsoo HM
AU  - Tarre A
AU  - Mändar H
AU  - Tamm A
AU  - Jõgiaas T
PY  - 2023
JO  - Nanomaterials (Basel, Switzerland)
DO  - 10.3390/nano13101607
UR  - https://doi.org/10.3390/nano13101607
ER  -

APA

M, K., HM, P., A, T., H, M., A, T., & T, J. (2023). Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano13101607

Source records

pubmed · retrieved 2026-09-26T20:35:08.643Z