Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator
- DOI
- 10.3390/nano13101698
- Published
- 2023-05-22
- Container
- Nanomaterials
- Publisher
- MDPI AG
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.3390/nano13101698,
title = {Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator},
author = {Eunyoung Jung and Choon-Sang Park and Taeeun Hong and Heung-Sik Tae},
year = {2023},
journal = {Nanomaterials},
doi = {10.3390/nano13101698},
url = {https://doi.org/10.3390/nano13101698}
}RIS
TY - JOUR TI - Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator AU - Eunyoung Jung AU - Choon-Sang Park AU - Taeeun Hong AU - Heung-Sik Tae PY - 2023 JO - Nanomaterials DO - 10.3390/nano13101698 UR - https://doi.org/10.3390/nano13101698 ER -
APA
Jung, E., Park, C., Hong, T., & Tae, H. (2023). Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator. Nanomaterials. https://doi.org/10.3390/nano13101698
Source records
- crossref · retrieved 2026-09-26T19:09:28.354Z