Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator

Eunyoung Jung, Choon-Sang Park, Taeeun Hong, Heung-Sik Tae

Open source

DOI
10.3390/nano13101698
Published
2023-05-22
Container
Nanomaterials
Publisher
MDPI AG
Open access
unknown

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BibTeX

@article{allodium:10.3390/nano13101698,
  title = {Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator},
  author = {Eunyoung Jung and Choon-Sang Park and Taeeun Hong and Heung-Sik Tae},
  year = {2023},
  journal = {Nanomaterials},
  doi = {10.3390/nano13101698},
  url = {https://doi.org/10.3390/nano13101698}
}

RIS

TY  - JOUR
TI  - Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator
AU  - Eunyoung Jung
AU  - Choon-Sang Park
AU  - Taeeun Hong
AU  - Heung-Sik Tae
PY  - 2023
JO  - Nanomaterials
DO  - 10.3390/nano13101698
UR  - https://doi.org/10.3390/nano13101698
ER  - 

APA

Jung, E., Park, C., Hong, T., & Tae, H. (2023). Structure and Dielectric Properties of Poly(vinylidenefluoride-co-trifluoroethylene) Copolymer Thin Films Using Atmospheric Pressure Plasma Deposition for Piezoelectric Nanogenerator. Nanomaterials. https://doi.org/10.3390/nano13101698

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