A Co-Sputtering Process Optimization for the Preparation of FeGaB Alloy Magnetostrictive Thin Films.

Lin Q, Wang Z, Meng Q, Mao Q, Xian D, Tian B

DOI: 10.3390/nano13222948
Published: 2023 Nov 15
Container: Nanomaterials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/nano13222948,
  title = {A Co-Sputtering Process Optimization for the Preparation of FeGaB Alloy Magnetostrictive Thin Films.},
  author = {Lin Q and Wang Z and Meng Q and Mao Q and Xian D and Tian B},
  year = {2023},
  journal = {Nanomaterials (Basel, Switzerland)},
  doi = {10.3390/nano13222948},
  url = {https://doi.org/10.3390/nano13222948}
}

RIS

TY  - JOUR
TI  - A Co-Sputtering Process Optimization for the Preparation of FeGaB Alloy Magnetostrictive Thin Films.
AU  - Lin Q
AU  - Wang Z
AU  - Meng Q
AU  - Mao Q
AU  - Xian D
AU  - Tian B
PY  - 2023
JO  - Nanomaterials (Basel, Switzerland)
DO  - 10.3390/nano13222948
UR  - https://doi.org/10.3390/nano13222948
ER  -

APA

Q, L., Z, W., Q, M., Q, M., D, X., & B, T. (2023). A Co-Sputtering Process Optimization for the Preparation of FeGaB Alloy Magnetostrictive Thin Films.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano13222948

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pubmed · retrieved 2026-11-10T09:41:06.249Z