CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology.
- DOI
- 10.3390/nano14100837
- Published
- 2024 May 9
- Container
- Nanomaterials (Basel, Switzerland)
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.3390/nano14100837,
title = {CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology.},
author = {Radamson HH and Miao Y and Zhou Z and Wu Z and Kong Z and Gao J and Yang H and Ren Y and Zhang Y and Shi J and Xiang J and Cui H and Lu B and Li J and Liu J and Lin H and Xu H and Li M and Cao J and He C and Duan X and Zhao X and Su J and Du Y and Yu J and Wu Y and Jiang M and Liang D and Li B and Dong Y and Wang G},
year = {2024},
journal = {Nanomaterials (Basel, Switzerland)},
doi = {10.3390/nano14100837},
url = {https://doi.org/10.3390/nano14100837}
}RIS
TY - JOUR TI - CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology. AU - Radamson HH AU - Miao Y AU - Zhou Z AU - Wu Z AU - Kong Z AU - Gao J AU - Yang H AU - Ren Y AU - Zhang Y AU - Shi J AU - Xiang J AU - Cui H AU - Lu B AU - Li J AU - Liu J AU - Lin H AU - Xu H AU - Li M AU - Cao J AU - He C AU - Duan X AU - Zhao X AU - Su J AU - Du Y AU - Yu J AU - Wu Y AU - Jiang M AU - Liang D AU - Li B AU - Dong Y AU - Wang G PY - 2024 JO - Nanomaterials (Basel, Switzerland) DO - 10.3390/nano14100837 UR - https://doi.org/10.3390/nano14100837 ER -
APA
HH, R., Y, M., Z, Z., Z, W., Z, K., J, G., H, Y., Y, R., Y, Z., J, S., J, X., H, C., B, L., J, L., J, L., H, L., H, X., M, L., J, C., C, H., X, D., X, Z., J, S., Y, D., J, Y., Y, W., M, J., D, L., B, L., Y, D., & G, W. (2024). CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano14100837
Source records
- pubmed · retrieved 2026-09-25T17:54:20.536Z