Improving the Performance of Arsenene Nanoribbon Gate-All-Around Tunnel Field-Effect Transistors Using H Defects.

Song S, Qin L, Wang Z, Lyu J, Gong J, Yang S

Open source

DOI
10.3390/nano14231960
Published
2024 Dec 6
Container
Nanomaterials (Basel, Switzerland)
Publisher
Not recorded
Open access
yes

Credibility signals

uncertain Score 53/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.3390/nano14231960,
  title = {Improving the Performance of Arsenene Nanoribbon Gate-All-Around Tunnel Field-Effect Transistors Using H Defects.},
  author = {Song S and Qin L and Wang Z and Lyu J and Gong J and Yang S},
  year = {2024},
  journal = {Nanomaterials (Basel, Switzerland)},
  doi = {10.3390/nano14231960},
  url = {https://doi.org/10.3390/nano14231960}
}

RIS

TY  - JOUR
TI  - Improving the Performance of Arsenene Nanoribbon Gate-All-Around Tunnel Field-Effect Transistors Using H Defects.
AU  - Song S
AU  - Qin L
AU  - Wang Z
AU  - Lyu J
AU  - Gong J
AU  - Yang S
PY  - 2024
JO  - Nanomaterials (Basel, Switzerland)
DO  - 10.3390/nano14231960
UR  - https://doi.org/10.3390/nano14231960
ER  - 

APA

S, S., L, Q., Z, W., J, L., J, G., & S, Y. (2024). Improving the Performance of Arsenene Nanoribbon Gate-All-Around Tunnel Field-Effect Transistors Using H Defects.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano14231960

Source records