Wafer-Scale Electrical Characterization of Al/Al(x)O(y)/Al Tunnel Junctions for Process Monitoring at Room Temperature.

Lang SJK, Eisele I, Weber J, Schewski A, Music E, Maiwald A, Hahn M, Zahn D, Luo Z, Nebrich L, Schoof B, Mayer T, Sturm-Rogon L, Lerch W, Pereira RN, Kutter C

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DOI: 10.3390/nano16100569
Published: 2026 May 7
Container: Nanomaterials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/nano16100569,
  title = {Wafer-Scale Electrical Characterization of Al/Al(x)O(y)/Al Tunnel Junctions for Process Monitoring at Room Temperature.},
  author = {Lang SJK and Eisele I and Weber J and Schewski A and Music E and Maiwald A and Hahn M and Zahn D and Luo Z and Nebrich L and Schoof B and Mayer T and Sturm-Rogon L and Lerch W and Pereira RN and Kutter C},
  year = {2026},
  journal = {Nanomaterials (Basel, Switzerland)},
  doi = {10.3390/nano16100569},
  url = {https://doi.org/10.3390/nano16100569}
}

RIS

TY  - JOUR
TI  - Wafer-Scale Electrical Characterization of Al/Al(x)O(y)/Al Tunnel Junctions for Process Monitoring at Room Temperature.
AU  - Lang SJK
AU  - Eisele I
AU  - Weber J
AU  - Schewski A
AU  - Music E
AU  - Maiwald A
AU  - Hahn M
AU  - Zahn D
AU  - Luo Z
AU  - Nebrich L
AU  - Schoof B
AU  - Mayer T
AU  - Sturm-Rogon L
AU  - Lerch W
AU  - Pereira RN
AU  - Kutter C
PY  - 2026
JO  - Nanomaterials (Basel, Switzerland)
DO  - 10.3390/nano16100569
UR  - https://doi.org/10.3390/nano16100569
ER  -

APA

SJK, L., I, E., J, W., A, S., E, M., A, M., M, H., D, Z., Z, L., L, N., B, S., T, M., L, S., W, L., RN, P., & C, K. (2026). Wafer-Scale Electrical Characterization of Al/Al(x)O(y)/Al Tunnel Junctions for Process Monitoring at Room Temperature.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano16100569

Source records

pubmed · retrieved 2026-09-26T11:21:20.568Z