Stitch-Less Lithography Empowered by Multi-Dimensional Holography.

Huang HH, Mu H, Puig Vilardell E, Anand V, Gailevičius D, Juodkazis S

DOI: 10.3390/nano16110692
Published: 2026 Jun 1
Container: Nanomaterials (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/nano16110692,
  title = {Stitch-Less Lithography Empowered by Multi-Dimensional Holography.},
  author = {Huang HH and Mu H and Puig Vilardell E and Anand V and Gailevičius D and Juodkazis S},
  year = {2026},
  journal = {Nanomaterials (Basel, Switzerland)},
  doi = {10.3390/nano16110692},
  url = {https://doi.org/10.3390/nano16110692}
}

RIS

TY  - JOUR
TI  - Stitch-Less Lithography Empowered by Multi-Dimensional Holography.
AU  - Huang HH
AU  - Mu H
AU  - Puig Vilardell E
AU  - Anand V
AU  - Gailevičius D
AU  - Juodkazis S
PY  - 2026
JO  - Nanomaterials (Basel, Switzerland)
DO  - 10.3390/nano16110692
UR  - https://doi.org/10.3390/nano16110692
ER  -

APA

HH, H., H, M., E, P. V., V, A., D, G., & S, J. (2026). Stitch-Less Lithography Empowered by Multi-Dimensional Holography.. Nanomaterials (Basel, Switzerland). https://doi.org/10.3390/nano16110692

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pubmed · retrieved 2026-11-10T16:44:25.198Z