Profile Study on Different Patterns in PMMA Bilayer Resist Configurations Under 20 keV Electron Beam Exposure

Ivan Kostic, Evgeniy Manoilov, Anna Bencurova, Elena Koleva, Robert Andok, Katia Vutova

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DOI: 10.3390/nano16201311
Published: 2026-10-16
Container: Nanomaterials
Publisher: MDPI AG
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.3390/nano16201311,
  title = {Profile Study on Different Patterns in PMMA Bilayer Resist Configurations Under 20 keV Electron Beam Exposure},
  author = {Ivan Kostic and Evgeniy Manoilov and Anna Bencurova and Elena Koleva and Robert Andok and Katia Vutova},
  year = {2026},
  journal = {Nanomaterials},
  doi = {10.3390/nano16201311},
  url = {https://doi.org/10.3390/nano16201311}
}

RIS

TY  - JOUR
TI  - Profile Study on Different Patterns in PMMA Bilayer Resist Configurations Under 20 keV Electron Beam Exposure
AU  - Ivan Kostic
AU  - Evgeniy Manoilov
AU  - Anna Bencurova
AU  - Elena Koleva
AU  - Robert Andok
AU  - Katia Vutova
PY  - 2026
JO  - Nanomaterials
DO  - 10.3390/nano16201311
UR  - https://doi.org/10.3390/nano16201311
ER  -

APA

Kostic, I., Manoilov, E., Bencurova, A., Koleva, E., Andok, R., & Vutova, K. (2026). Profile Study on Different Patterns in PMMA Bilayer Resist Configurations Under 20 keV Electron Beam Exposure. Nanomaterials. https://doi.org/10.3390/nano16201311

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crossref · retrieved 2026-11-08T22:38:40.947Z