ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition
- DOI
- 10.3390/nano9071035
- Published
- 2019-07-19
- Container
- Nanomaterials
- Publisher
- MDPI AG
- Open access
- unknown
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BibTeX
@article{allodium:10.3390/nano9071035,
title = {ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition},
author = {Alireza M. Kia and Nora Haufe and Sajjad Esmaeili and Clemens Mart and Mikko Utriainen and Riikka L. Puurunen and Wenke Weinreich},
year = {2019},
journal = {Nanomaterials},
doi = {10.3390/nano9071035},
url = {https://doi.org/10.3390/nano9071035}
}RIS
TY - JOUR TI - ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition AU - Alireza M. Kia AU - Nora Haufe AU - Sajjad Esmaeili AU - Clemens Mart AU - Mikko Utriainen AU - Riikka L. Puurunen AU - Wenke Weinreich PY - 2019 JO - Nanomaterials DO - 10.3390/nano9071035 UR - https://doi.org/10.3390/nano9071035 ER -
APA
Kia, A. M., Haufe, N., Esmaeili, S., Mart, C., Utriainen, M., Puurunen, R. L., & Weinreich, W. (2019). ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition. Nanomaterials. https://doi.org/10.3390/nano9071035
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- crossref · retrieved 2026-09-27T05:24:21.405Z