Low-Cost Shadow Mask Fabrication for Nanoelectronics

Thomas Pucher, Pablo Bastante, Estrella Sánchez Viso, Andres Castellanos-Gomez

Open source

DOI: 10.3390/nanomanufacturing3030022
Published: 2023-08-16
Container: Nanomanufacturing
Publisher: MDPI AG
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.3390/nanomanufacturing3030022,
  title = {Low-Cost Shadow Mask Fabrication for Nanoelectronics},
  author = {Thomas Pucher and Pablo Bastante and Estrella Sánchez Viso and Andres Castellanos-Gomez},
  year = {2023},
  journal = {Nanomanufacturing},
  doi = {10.3390/nanomanufacturing3030022},
  url = {https://doi.org/10.3390/nanomanufacturing3030022}
}

RIS

TY  - JOUR
TI  - Low-Cost Shadow Mask Fabrication for Nanoelectronics
AU  - Thomas Pucher
AU  - Pablo Bastante
AU  - Estrella Sánchez Viso
AU  - Andres Castellanos-Gomez
PY  - 2023
JO  - Nanomanufacturing
DO  - 10.3390/nanomanufacturing3030022
UR  - https://doi.org/10.3390/nanomanufacturing3030022
ER  -

APA

Pucher, T., Bastante, P., Viso, E. S., & Castellanos-Gomez, A. (2023). Low-Cost Shadow Mask Fabrication for Nanoelectronics. Nanomanufacturing. https://doi.org/10.3390/nanomanufacturing3030022

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crossref · retrieved 2026-11-03T19:30:48.860Z