A Study on Polymer Dispersants in CMP Ceria Slurry for the Polysilicon Film Removal Suppression.

Cho J, Ahn S, Hwang S, Kim W

DOI: 10.3390/polym18192326
Published: 2026 Sep 24
Container: Polymers
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/polym18192326,
  title = {A Study on Polymer Dispersants in CMP Ceria Slurry for the Polysilicon Film Removal Suppression.},
  author = {Cho J and Ahn S and Hwang S and Kim W},
  year = {2026},
  journal = {Polymers},
  doi = {10.3390/polym18192326},
  url = {https://doi.org/10.3390/polym18192326}
}

RIS

TY  - JOUR
TI  - A Study on Polymer Dispersants in CMP Ceria Slurry for the Polysilicon Film Removal Suppression.
AU  - Cho J
AU  - Ahn S
AU  - Hwang S
AU  - Kim W
PY  - 2026
JO  - Polymers
DO  - 10.3390/polym18192326
UR  - https://doi.org/10.3390/polym18192326
ER  -

APA

J, C., S, A., S, H., & W, K. (2026). A Study on Polymer Dispersants in CMP Ceria Slurry for the Polysilicon Film Removal Suppression.. Polymers. https://doi.org/10.3390/polym18192326

Source records

pubmed · retrieved 2026-11-10T06:56:39.963Z
europe-pmc · retrieved 2026-11-10T06:56:39.977Z
europe-pmc · retrieved 2026-11-10T06:56:39.977Z