Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma.

Cho C, Kim S, Lee Y, Jeong W, Seong I, Lee J, Choi M, You Y, Lee S, Lee J, You S

Open source

DOI
10.3390/s22176589
Published
2022 Aug 31
Container
Sensors (Basel, Switzerland)
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.3390/s22176589,
  title = {Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma.},
  author = {Cho C and Kim S and Lee Y and Jeong W and Seong I and Lee J and Choi M and You Y and Lee S and Lee J and You S},
  year = {2022},
  journal = {Sensors (Basel, Switzerland)},
  doi = {10.3390/s22176589},
  url = {https://doi.org/10.3390/s22176589}
}

RIS

TY  - JOUR
TI  - Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma.
AU  - Cho C
AU  - Kim S
AU  - Lee Y
AU  - Jeong W
AU  - Seong I
AU  - Lee J
AU  - Choi M
AU  - You Y
AU  - Lee S
AU  - Lee J
AU  - You S
PY  - 2022
JO  - Sensors (Basel, Switzerland)
DO  - 10.3390/s22176589
UR  - https://doi.org/10.3390/s22176589
ER  - 

APA

C, C., S, K., Y, L., W, J., I, S., J, L., M, C., Y, Y., S, L., J, L., & S, Y. (2022). Refined Appearance Potential Mass Spectrometry for High Precision Radical Density Quantification in Plasma.. Sensors (Basel, Switzerland). https://doi.org/10.3390/s22176589

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