Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes.

Li G, Lin W, Liu S, Aileplanm Y, Du A, Li L

DOI: 10.3390/s25226974
Published: 2025 Nov 14
Container: Sensors (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/s25226974,
  title = {Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes.},
  author = {Li G and Lin W and Liu S and Aileplanm Y and Du A and Li L},
  year = {2025},
  journal = {Sensors (Basel, Switzerland)},
  doi = {10.3390/s25226974},
  url = {https://doi.org/10.3390/s25226974}
}

RIS

TY  - JOUR
TI  - Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes.
AU  - Li G
AU  - Lin W
AU  - Liu S
AU  - Aileplanm Y
AU  - Du A
AU  - Li L
PY  - 2025
JO  - Sensors (Basel, Switzerland)
DO  - 10.3390/s25226974
UR  - https://doi.org/10.3390/s25226974
ER  -

APA

G, L., W, L., S, L., Y, A., A, D., & L, L. (2025). Recent Developments and Challenges of Edge Termination Techniques for Vertical Diamond Schottky Barrier Diodes.. Sensors (Basel, Switzerland). https://doi.org/10.3390/s25226974

Source records

pubmed · retrieved 2026-09-26T17:48:45.753Z