A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment.

Joo K, Lee KH, Jeon JW

DOI: 10.3390/s26123650
Published: 2026 Jun 8
Container: Sensors (Basel, Switzerland)
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.3390/s26123650,
  title = {A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment.},
  author = {Joo K and Lee KH and Jeon JW},
  year = {2026},
  journal = {Sensors (Basel, Switzerland)},
  doi = {10.3390/s26123650},
  url = {https://doi.org/10.3390/s26123650}
}

RIS

TY  - JOUR
TI  - A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment.
AU  - Joo K
AU  - Lee KH
AU  - Jeon JW
PY  - 2026
JO  - Sensors (Basel, Switzerland)
DO  - 10.3390/s26123650
UR  - https://doi.org/10.3390/s26123650
ER  -

APA

K, J., KH, L., & JW, J. (2026). A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment.. Sensors (Basel, Switzerland). https://doi.org/10.3390/s26123650

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pubmed · retrieved 2026-11-10T07:39:45.964Z