Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor
- DOI
- 10.3762/bjnano.14.78
- Published
- 2023-09-15
- Container
- Beilstein Journal of Nanotechnology
- Publisher
- Beilstein Institut
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.3762/bjnano.14.78,
title = {Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor},
author = {Mathias Franz and Mahnaz Safian Jouzdani and Lysann Kaßner and Marcus Daniel and Frank Stahr and Stefan E Schulz},
year = {2023},
journal = {Beilstein Journal of Nanotechnology},
doi = {10.3762/bjnano.14.78},
url = {https://doi.org/10.3762/bjnano.14.78}
}RIS
TY - JOUR TI - Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor AU - Mathias Franz AU - Mahnaz Safian Jouzdani AU - Lysann Kaßner AU - Marcus Daniel AU - Frank Stahr AU - Stefan E Schulz PY - 2023 JO - Beilstein Journal of Nanotechnology DO - 10.3762/bjnano.14.78 UR - https://doi.org/10.3762/bjnano.14.78 ER -
APA
Franz, M., Jouzdani, M. S., Kaßner, L., Daniel, M., Stahr, F., & Schulz, S. E. (2023). Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor. Beilstein Journal of Nanotechnology. https://doi.org/10.3762/bjnano.14.78
Source records
- crossref · retrieved 2026-09-27T07:42:39.451Z