Ambient pressure XPS at MAX IV

Mattia Scardamaglia, Ulrike Küst, Alexander Klyushin, Rosemary Jones, Jan Knudsen, Robert Temperton, Andrey Shavorskiy, Esko Kokkonen

Open source

DOI: 10.3762/bjnano.16.118
Published: 2025-09-24
Container: Beilstein Journal of Nanotechnology
Publisher: Beilstein Institut
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.3762/bjnano.16.118,
  title = {Ambient pressure XPS at MAX IV},
  author = {Mattia Scardamaglia and Ulrike Küst and Alexander Klyushin and Rosemary Jones and Jan Knudsen and Robert Temperton and Andrey Shavorskiy and Esko Kokkonen},
  year = {2025},
  journal = {Beilstein Journal of Nanotechnology},
  doi = {10.3762/bjnano.16.118},
  url = {https://doi.org/10.3762/bjnano.16.118}
}

RIS

TY  - JOUR
TI  - Ambient pressure XPS at MAX IV
AU  - Mattia Scardamaglia
AU  - Ulrike Küst
AU  - Alexander Klyushin
AU  - Rosemary Jones
AU  - Jan Knudsen
AU  - Robert Temperton
AU  - Andrey Shavorskiy
AU  - Esko Kokkonen
PY  - 2025
JO  - Beilstein Journal of Nanotechnology
DO  - 10.3762/bjnano.16.118
UR  - https://doi.org/10.3762/bjnano.16.118
ER  -

APA

Scardamaglia, M., Küst, U., Klyushin, A., Jones, R., Knudsen, J., Temperton, R., Shavorskiy, A., & Kokkonen, E. (2025). Ambient pressure XPS at MAX IV. Beilstein Journal of Nanotechnology. https://doi.org/10.3762/bjnano.16.118

Source records

crossref · retrieved 2026-09-25T17:53:54.098Z