Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering.
- DOI
- 10.3762/bjnano.6.207
- Published
- 2015
- Container
- Beilstein journal of nanotechnology
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.3762/bjnano.6.207,
title = {Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering.},
author = {Ghazzal MN and Aubry E and Chaoui N and Robert D},
year = {2015},
journal = {Beilstein journal of nanotechnology},
doi = {10.3762/bjnano.6.207},
url = {https://doi.org/10.3762/bjnano.6.207}
}RIS
TY - JOUR TI - Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering. AU - Ghazzal MN AU - Aubry E AU - Chaoui N AU - Robert D PY - 2015 JO - Beilstein journal of nanotechnology DO - 10.3762/bjnano.6.207 UR - https://doi.org/10.3762/bjnano.6.207 ER -
APA
MN, G., E, A., N, C., & D, R. (2015). Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering.. Beilstein journal of nanotechnology. https://doi.org/10.3762/bjnano.6.207
Source records
- pubmed · retrieved 2026-09-27T14:31:02.231Z
- europe-pmc · retrieved 2026-09-27T14:31:02.245Z
- hal · retrieved 2026-09-27T14:31:02.267Z