Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering.

Ghazzal MN, Aubry E, Chaoui N, Robert D

Open source

DOI
10.3762/bjnano.6.207
Published
2015
Container
Beilstein journal of nanotechnology
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.3762/bjnano.6.207,
  title = {Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering.},
  author = {Ghazzal MN and Aubry E and Chaoui N and Robert D},
  year = {2015},
  journal = {Beilstein journal of nanotechnology},
  doi = {10.3762/bjnano.6.207},
  url = {https://doi.org/10.3762/bjnano.6.207}
}

RIS

TY  - JOUR
TI  - Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering.
AU  - Ghazzal MN
AU  - Aubry E
AU  - Chaoui N
AU  - Robert D
PY  - 2015
JO  - Beilstein journal of nanotechnology
DO  - 10.3762/bjnano.6.207
UR  - https://doi.org/10.3762/bjnano.6.207
ER  - 

APA

MN, G., E, A., N, C., & D, R. (2015). Effect of SiN x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO2 films obtained by sol-gel dip coating and reactive magnetron sputtering.. Beilstein journal of nanotechnology. https://doi.org/10.3762/bjnano.6.207

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