A statistical method to optimize the chemical etching process of Zinc Oxide thin films

Chandrahalim, Hengky, Lynes, David, Brown, Justin, Singh, Karanvir, Bodily, Kyle, Leedy, Kevin

DOI: 10.5061/dryad.73n5tb2xx
Published: 2021
Container: Not recorded
Publisher: Dryad
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.5061/dryad.73n5tb2xx,
  title = {A statistical method to optimize the chemical etching process of Zinc Oxide thin films},
  author = {Chandrahalim, Hengky and Lynes, David and Brown, Justin and Singh, Karanvir and Bodily, Kyle and Leedy, Kevin},
  year = {2021},
  doi = {10.5061/dryad.73n5tb2xx},
  url = {https://doi.org/10.5061/dryad.73n5tb2xx}
}

RIS

TY  - JOUR
TI  - A statistical method to optimize the chemical etching process of Zinc Oxide thin films
AU  - Chandrahalim, Hengky
AU  - Lynes, David
AU  - Brown, Justin
AU  - Singh, Karanvir
AU  - Bodily, Kyle
AU  - Leedy, Kevin
PY  - 2021
DO  - 10.5061/dryad.73n5tb2xx
UR  - https://doi.org/10.5061/dryad.73n5tb2xx
ER  -

APA

Hengky, C., David, L., Justin, B., Karanvir, S., Kyle, B., & Kevin, L. (2021). A statistical method to optimize the chemical etching process of Zinc Oxide thin films. https://doi.org/10.5061/dryad.73n5tb2xx

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datacite · retrieved 2026-09-27T00:36:56.437Z