Advanced Process Control and Statistical Process Control Data for Thickness Prediction of AlCu and WTi Metal Layer in Semiconductor Manufacturing
- DOI
- 10.5281/zenodo.16881337
- Published
- 2026
- Container
- Not recorded
- Publisher
- Zenodo
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.5281/zenodo.16881337,
title = {Advanced Process Control and Statistical Process Control Data for Thickness Prediction of AlCu and WTi Metal Layer in Semiconductor Manufacturing},
author = {Mević, Amina and Laber, Andreas and Krivic, Senka},
year = {2026},
doi = {10.5281/zenodo.16881337},
url = {https://doi.org/10.5281/zenodo.16881337}
}RIS
TY - JOUR TI - Advanced Process Control and Statistical Process Control Data for Thickness Prediction of AlCu and WTi Metal Layer in Semiconductor Manufacturing AU - Mević, Amina AU - Laber, Andreas AU - Krivic, Senka PY - 2026 DO - 10.5281/zenodo.16881337 UR - https://doi.org/10.5281/zenodo.16881337 ER -
APA
Amina, M., Andreas, L., & Senka, K. (2026). Advanced Process Control and Statistical Process Control Data for Thickness Prediction of AlCu and WTi Metal Layer in Semiconductor Manufacturing. https://doi.org/10.5281/zenodo.16881337