Development of Electrodeposition Coating for SOFC Interconnector

Takayuki NAKAO, Shuichi INOUE, Tadashi SAITO, Zenzo TSUKAMOTO, Shigefumi NISHIMURA, Tetsuro FUJIMOTO

Open source

DOI: 10.5796/electrochemistry.21-00077
Published: 2021-11-05
Container: Electrochemistry
Publisher: The Electrochemical Society of Japan
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.5796/electrochemistry.21-00077,
  title = {Development of Electrodeposition Coating for SOFC Interconnector},
  author = {Takayuki NAKAO and Shuichi INOUE and Tadashi SAITO and Zenzo TSUKAMOTO and Shigefumi NISHIMURA and Tetsuro FUJIMOTO},
  year = {2021},
  journal = {Electrochemistry},
  doi = {10.5796/electrochemistry.21-00077},
  url = {https://doi.org/10.5796/electrochemistry.21-00077}
}

RIS

TY  - JOUR
TI  - Development of Electrodeposition Coating for SOFC Interconnector
AU  - Takayuki NAKAO
AU  - Shuichi INOUE
AU  - Tadashi SAITO
AU  - Zenzo TSUKAMOTO
AU  - Shigefumi NISHIMURA
AU  - Tetsuro FUJIMOTO
PY  - 2021
JO  - Electrochemistry
DO  - 10.5796/electrochemistry.21-00077
UR  - https://doi.org/10.5796/electrochemistry.21-00077
ER  -

APA

NAKAO, T., INOUE, S., SAITO, T., TSUKAMOTO, Z., NISHIMURA, S., & FUJIMOTO, T. (2021). Development of Electrodeposition Coating for SOFC Interconnector. Electrochemistry. https://doi.org/10.5796/electrochemistry.21-00077

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crossref · retrieved 2026-09-26T06:12:20.860Z