Tailored waveform biasing for precise ion-energy control during plasma-enhanced atomic layer deposition of nitrides

Adriaan Mackus, Silke Peeters, Arthur de Jong, H.C.M. Knoops, W. Kessels

DOI: 10.60893/figshare.apl.c.8761218
Published: 2026
Container: Not recorded
Publisher: AIP Publishing
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.60893/figshare.apl.c.8761218,
  title = {Tailored waveform biasing for precise ion-energy control during plasma-enhanced atomic layer deposition of nitrides},
  author = {Adriaan Mackus and Silke Peeters and Arthur de Jong and H.C.M. Knoops and W. Kessels},
  year = {2026},
  doi = {10.60893/figshare.apl.c.8761218},
  url = {https://doi.org/10.60893/figshare.apl.c.8761218}
}

RIS

TY  - JOUR
TI  - Tailored waveform biasing for precise ion-energy control during plasma-enhanced atomic layer deposition of nitrides
AU  - Adriaan Mackus
AU  - Silke Peeters
AU  - Arthur de Jong
AU  - H.C.M. Knoops
AU  - W. Kessels
PY  - 2026
DO  - 10.60893/figshare.apl.c.8761218
UR  - https://doi.org/10.60893/figshare.apl.c.8761218
ER  -

APA

Mackus, A., Peeters, S., Jong, A. D., Knoops, H., & Kessels, W. (2026). Tailored waveform biasing for precise ion-energy control during plasma-enhanced atomic layer deposition of nitrides. https://doi.org/10.60893/figshare.apl.c.8761218

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datacite · retrieved 2026-11-08T13:37:35.351Z