Effect of Ion Implantation Energy on Structure and Property of Copper Layer on Surface of Ultra-thin PI Films

ZHONG Li, ZHANG Hong, WANG Xiaoyu, JIN Fanya, ZHANG Kejia, LIU Xuan, HUANG Yi

Open source

DOI: 10.7538/yzk.2026.youxian.0220
Published: 9
Container: Yuanzineng kexue jishu
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.7538/yzk.2026.youxian.0220,
  title = {Effect of Ion Implantation Energy on Structure and Property of Copper Layer on Surface of Ultra-thin PI Films},
  author = {ZHONG Li,  ZHANG Hong,  WANG Xiaoyu,  JIN Fanya,  ZHANG Kejia,  LIU Xuan,  HUANG Yi},
  year = {2026},
  journal = {Yuanzineng kexue jishu},
  doi = {10.7538/yzk.2026.youxian.0220},
  url = {https://doi.org/10.7538/yzk.2026.youxian.0220}
}

RIS

TY  - JOUR
TI  - Effect of Ion Implantation Energy on Structure and Property of Copper Layer on Surface of Ultra-thin PI Films
AU  - ZHONG Li,  ZHANG Hong,  WANG Xiaoyu,  JIN Fanya,  ZHANG Kejia,  LIU Xuan,  HUANG Yi
PY  - 2026
JO  - Yuanzineng kexue jishu
DO  - 10.7538/yzk.2026.youxian.0220
UR  - https://doi.org/10.7538/yzk.2026.youxian.0220
ER  -

APA

Yi, Z. L. Z. H. W. X. J. F. Z. K. L. X. H. (2026). Effect of Ion Implantation Energy on Structure and Property of Copper Layer on Surface of Ultra-thin PI Films. Yuanzineng kexue jishu. https://doi.org/10.7538/yzk.2026.youxian.0220

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doaj · retrieved 2026-11-10T18:14:30.492Z