Marginal Adaptation of Epoxy Resin and Calcium Silicate Sealers Under Two Obturation Techniques: A Scanning Electron Microscope Study.

Saha S, Pal S, Singh BK, Wang CK, Raman R

DOI: 10.7759/cureus.116783
Published: 2026 Sep
Container: Cureus
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.7759/cureus.116783,
  title = {Marginal Adaptation of Epoxy Resin and Calcium Silicate Sealers Under Two Obturation Techniques: A Scanning Electron Microscope Study.},
  author = {Saha S and Pal S and Singh BK and Wang CK and Raman R},
  year = {2026},
  journal = {Cureus},
  doi = {10.7759/cureus.116783},
  url = {https://doi.org/10.7759/cureus.116783}
}

RIS

TY  - JOUR
TI  - Marginal Adaptation of Epoxy Resin and Calcium Silicate Sealers Under Two Obturation Techniques: A Scanning Electron Microscope Study.
AU  - Saha S
AU  - Pal S
AU  - Singh BK
AU  - Wang CK
AU  - Raman R
PY  - 2026
JO  - Cureus
DO  - 10.7759/cureus.116783
UR  - https://doi.org/10.7759/cureus.116783
ER  -

APA

S, S., S, P., BK, S., CK, W., & R, R. (2026). Marginal Adaptation of Epoxy Resin and Calcium Silicate Sealers Under Two Obturation Techniques: A Scanning Electron Microscope Study.. Cureus. https://doi.org/10.7759/cureus.116783

Source records

pubmed · retrieved 2026-11-10T07:25:14.879Z