Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System

H Frey, R Lauth, H Khan, N Eisenreich, A Koleczko

Open source

DOI: 10.9734/psij/2017/33788
Published: 2017-01-10
Container: Physical Science International Journal
Publisher: Sciencedomain International
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.9734/psij/2017/33788,
  title = {Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System},
  author = {H Frey and R Lauth and H Khan and N Eisenreich and A Koleczko},
  year = {2017},
  journal = {Physical Science International Journal},
  doi = {10.9734/psij/2017/33788},
  url = {https://doi.org/10.9734/psij/2017/33788}
}

RIS

TY  - JOUR
TI  - Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System
AU  - H Frey
AU  - R Lauth
AU  - H Khan
AU  - N Eisenreich
AU  - A Koleczko
PY  - 2017
JO  - Physical Science International Journal
DO  - 10.9734/psij/2017/33788
UR  - https://doi.org/10.9734/psij/2017/33788
ER  -

APA

Frey, H., Lauth, R., Khan, H., Eisenreich, N., & Koleczko, A. (2017). Deposition of Silicon Films from Liquid Cyclopentasilane Precursors Using High Pressure Spray System. Physical Science International Journal. https://doi.org/10.9734/psij/2017/33788

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crossref · retrieved 2026-09-27T12:41:30.530Z