Stress Relaxation Mechanism in the Si-SiO2 System and Its Influence on the Interface Properties
- Type
- Retraction
- Notice date
- 11/22/2017 0:00
- Journal
- Physica Status Solidi C
- Publisher
- Wiley
- Notice DOI
- 10.1002/pssc.201701001
- Original paper DOI
- 10.1002/pssc.201600051