Atomic simulation of deposition and etching on the surface of Si bombarded by energetic SiF3
- Type
- Retraction
- Notice date
- 8/10/2006 0:00
- Journal
- Plasma Sources Science and Technology
- Publisher
- IOP Publishing
- Notice DOI
- 10.1088/0963-0252/15/4/014
- Original paper DOI
- 10.1088/0963-0252/15/4/014