Retraction notices

Redistribution of infused and implanted dopants in a multilayer structure during annealing of dopant and radiation defects for the production of a system of p–n junctions

Type
Retraction
Notice date
4/1/2009 0:00
Journal
Semiconductor Science and Technology
Publisher
IOP Publishing
Notice DOI
10.1088/0268-1242/24/4/049801
Original paper DOI
10.1088/0268-1242/23/9/095005

Reasons

Matching venue names

Name match only, not an authoritative journal identifier.