Retraction notices

Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Type

Retraction

Notice date

2/22/2021 0:00

Journal

Scientific Reports

Publisher

Springer - Nature Publishing Group

Notice DOI

10.1038/s41598-021-84101-3

Original paper DOI

10.1038/srep11463

Reasons

• Concerns/Issues about Data
• Concerns/Issues about Image
• Unreliable Data
• Unreliable Image

Matching venue names

Name match only, not an authoritative journal identifier.

• Scientific Reports
• Scientific Reports