Effect of Fluoride Layer Growth on the Deposition Rate under Different Microchannel Structures
- Type
- Retraction
- Notice date
- 2/28/2024 0:00
- Journal
- ACS Omega
- Publisher
- American Chemical Society (ACS)
- Notice DOI
- 10.1021/acsomega.4c01652
- Original paper DOI
- 10.1021/acsomega.3c06182