Retraction notices

Effects of high-temperature diluted-H2 annealing on effective mobility of 4H-SiC MOSFETs with thermally-grown SiO2

Type
Retraction
Notice date
6/19/2017 0:00
Journal
Japanese Journal of Applied Physics
Publisher
IOP Publishing
Notice DOI
10.7567/jjap.56.079201
Original paper DOI
10.7567/jjap.55.04er16

Reasons

Matching venue names

Name match only, not an authoritative journal identifier.