Retraction notices

Surface Chemistry of Preferentially (111)- and (220)-Crystal-Oriented Microcrystalline Silicon Films by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition

Type
Retraction
Notice date
7/19/2016 0:00
Journal
Japanese Journal of Applied Physics
Publisher
IOP Publishing
Notice DOI
10.7567/jjap.55.089203
Original paper DOI
10.1143/jjap.49.081402

Reasons

Matching venue names

Name match only, not an authoritative journal identifier.