Retraction notices

Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene): Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry

Type
Retraction
Notice date
7/19/2016 0:00
Journal
Japanese Journal of Applied Physics
Publisher
IOP Publishing
Notice DOI
10.7567/jjap.55.089201
Original paper DOI
10.1143/jjap.50.08jg02

Reasons

Matching venue names

Name match only, not an authoritative journal identifier.