Retraction notices

Optimization of plasma etch rate of deposited thin films by adaptive neuro fuzzy inference system

Type

Retraction

Notice date

9/4/2024 0:00

Journal

The International Journal of Advanced Manufacturing Technology

Publisher

Springer - Nature Publishing Group

Notice DOI

10.1007/s00170-024-14355-4

Original paper DOI

10.1007/s00170-022-10198-z

Reasons

• Concerns/Issues about Authorship/Affiliation
• Euphemisms for Plagiarism
• Plagiarism of/in Article
• Unreliable Results and/or Conclusions

Matching venue names

Name match only, not an authoritative journal identifier.

• The International Journal of Advanced Manufacturing Technology