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Development of optical coatings for 157-nm lithography. I. Coating materials.
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Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement.
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Difluorooxymethylene-Bridged Liquid Crystals: A Novel Synthesis Based on the Oxidative Alkoxydifluorodesulfuration of Dithianylium Salts We thank A. Hahn and R. Sander for experimental assistance, and Dr. J. Krause, J. Haas, and H. Heldmann for the physical evaluation of the new substances. A part of the work presented in this article was performed under the management of the Association of Super-Advanced Electronics Industries (ASET) in the R&D program of the Japanese Ministry of International Trade and Industry (MITI) supported by the New Energy and Industrial Development Organization (NEDO). Another part was supported by the German Bundesministerium für Bildung und Forschung (01 BM 904).
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